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DGAP-News: Obducat AB < OBD> english

Obducat AB: Important Obducat NIL patent granted in the US

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The issuer is solely responsible for the content of this announcement.
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PRESS RELEASE August 4, 2005


Important Obducat NIL patent granted in the US

Obducat has received a US patent regarding anti-stick treatment of stampers,
being used in the NIL process.

The patent covers an important process whereby a stamper is covered with a
nano meter thin layer, ensuring a high quality imprint result. The process
also contributes to an increased cost efficiency in NIL, already forming one
of the major driving forces behind many of the industrial projects presently
engaging Obducat.

Patrik Lundstöm, CEO Obducat, says in a first comment:

" This is an important milestone. Being able to anti-stick stampers is an
essential prerequisite for the coming NIL industrialization and it is very
positive receiving this patent on a key market."


For further information please contact:

Patrik Lundström, CEO, +46 40 36 21 00 or +46 703 27 37 38


Obducat AB is an innovative developer and supplier of technologies, products
and processes used for the production and replication of advanced micro and
nano structures. Obducat's products and services are intended to serve the
demands of companies within the information storage, semiconductor, printed
circuit board, and sensor industries. Obducat's technologies include electron
beam and nano imprint technology. Obducat has offices in Sweden and the
UK, with the head quarters located in Malmö, Sweden. The Obducat shares are
publicly traded on the Swedish NGM stock exchange.
Read more at http://www.obducat.com